Simulating resistive switching in heterostructures based on oxide compounds. Bulletin of the Russian Academy of Sciences: Physics Volume 77, Issue 3, March 2013, Pages 265-267

14 сентября 2018
210
Предметная область
Выходные данные
Ключевые слова
Вид публикации Статья
Контактные данные автора публикации Tulina, N.A.a , Sirotkin, V.V.b, Borisenko, I.Y.b, Ivanov, A.A.c a Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka 142432, Russian Federation b Institute of Microelectronics Technology and High Purity M
Ссылка на публикацию в интернете www.scopus.com/record/display.url?origin=recordpage&eid=2-s2.0-84886583724&citeCnt=3&noHighlight=false&sort=plf-f&src=s&st1=MEPhI&nlo=&nlr=&nls=&sid=F0743CC1BB1CEC168410A18CB87C48A7.Vdktg6RVtMfaQJ4pNTCQ:6500&sot=b&sdt=b&sl=31&s=AFFIL(MEPhI) AND PU

Аннотация

Simulations are used to study the influence of nonuniform electric field distribution at a heterojunction interface on the effect of bipolar resistive switching in oxide compounds. Computer models show that a conducting channel forms at the edge of a heterojunction area characterized by strong local increase in the electric field intensity. The computations are confirmed by the low temperature properties of metastable phases in heterojunctions based on high temperature superconductors. © 2013 Allerton Press, Inc.



--------------------------------------------------------------------------------


Indexed keywords

Computer models; Conducting channels; Electric field intensities; Heterojunction interfaces; Nonuniform electric field; Oxide compounds; Resistive switching
Подробнее
Для того чтобы оставить комментарий необходимо авторизоваться.